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検索キーワード:(件名: #Photoresists)
該当件数:5件
Semiconductor lithography : principles, practices, and materials / Wayne M. Moreau
New York : Plenum Press , c1988. - (Microdevices : physics and fabrication technologies)
図書
Photoreactive polymers : the science and technology of resists / Arnost Reiser
New York : Wiley , c1989
Electronic and photonic applications of polymers / Murrae J. Bowden, editor, S. Richard Turner, editor
Washington, DC : American Chemical Society , 1988. - (Advances in chemistry series ; 218)
Introduction to microlithography : theory, materials, and processing / L.F. Thompson, editor, C.G. Willson, editor, M.J. Bowden, editor ; based on a workshop sponsored by the ACS Division of Organic Coatings and Plastics Chemistry at the 185th Meeting of the American Chemical Society, Seattle, Washington, March 20-25, 1983
Washington, D.C. : The American Chemical Society , 1983. - (ACS symposium series ; 219)
Materials for microlithography : radiation-sensitive polymers / L.F. Thompson, editor, C.G. Willson, editor, J.M.J. Fréchet, editor ; based on a symposium cosponsored by the Division of Polymeric Materials, Science and Engineering and the Division of Polymer Chemistry, at the 187th Meeting of the American Chemical Society, St. Louis, Missouri, April 8-13, 1984
Washington, D.C. : The Society , 1984. - (ACS symposium series ; 266)