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Introduction to microlithography : theory, materials, and processing / L.F. Thompson, editor, C.G. Willson, editor, M.J. Bowden, editor ; based on a workshop sponsored by the ACS Division of Organic Coatings and Plastics Chemistry at the 185th Meeting of the American Chemical Society, Seattle, Washington, March 20-25, 1983
(ACS symposium series ; 219)

データ種別 図書
出版者 Washington, D.C. : The American Chemical Society
出版年 1983
本文言語 英語
大きさ ix, 363 p. : ill. ; 24 cm

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2F図書 (自然科学・技術・産業・芸術)
749.5||I 9852303460


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内容注記 An introduction to lithography / L.F. Thompson
The lithographic process
The physics / L.F. Thompson and M.J. Bowden
Organic resist materials
Theory and chemistry / C. Grant Willson
Resist processing / L.F. Thompson and M.J. Bowden
Plasma etching / J.A. Mucha and D.W. Hess
Multi-layer resist systems / B.J. Lin
一般注記 Includes bibliographical references and index
著者標目 Thompson, L. F., 1944-
Willson, C. G. (C. Grant), 1939-
Bowden, M. J., 1943-
American Chemical Society. Division of Polymeric Materials : Science and Engineering
American Chemical Society. Meeting (185th : 1983 : Seattle, Wash.)
分 類 LCC:TR940
DC19:686.2/315
NDLC:PE31
件 名 LCSH:Microlithography -- Congresses  全ての件名で検索
LCSH:Photoresists -- Congresses  全ての件名で検索
LCSH:Plasma etching -- Congresses  全ての件名で検索
書誌ID TY20016239
NCID BA04572087