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Materials for microlithography : radiation-sensitive polymers / L.F. Thompson, editor, C.G. Willson, editor, J.M.J. Fréchet, editor ; based on a symposium cosponsored by the Division of Polymeric Materials, Science and Engineering and the Division of Polymer Chemistry, at the 187th Meeting of the American Chemical Society, St. Louis, Missouri, April 8-13, 1984
(ACS symposium series ; 266)

データ種別 図書
出版者 Washington, D.C. : The Society
出版年 1984
大きさ viii, 494 p. : ill. ; 24 cm

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2F図書 (自然科学・技術・産業・芸術)
549.8||M11 9852408694


積層4層
549.8||M11||(B) 9852410620