Morgan, Russ A., 1950-
著者名典拠詳細を表示
| 著者の属性 | 個人 |
|---|---|
| 一般注記 | His Plasma etching in semiconductor fabrication, c1985: CIP t.p. (Russ A. Morgan, Univ. Sussex; Brit. Telecom Res. Laboratories, Ipswich, U.K.) data sheet, etc. (b. 11-4-50; presently affil.: MMI, Santa Clara, CA) |
| コード類 | 典拠ID=AU20012065 NCID=DA00006084 |
| 1 | Plasma etching in semiconductor fabrication / Russ A. Morgan Amsterdam ; Tokyo : Elsevier , c1985 |